EV Charging Stations
Filtration for Power Equipment
Cleanroom & Semiconductor
Ultra-High Cleanliness Filtration
Commercial HVAC
Central Air System Filtration
Data Centers
Precision Equipment Protection
Livestock & Farming
Farming Environment Purification
Spray Booths & Industrial Dust
Paint Mist & Dust Purification
Filtration for Power Equipment
Professional air filtration for EV charging devices, protecting against dust and sand ingress to ensure stable, reliable operation of charging piles and station infrastructure.
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Ultra-high efficiency filtration for semiconductor wafer fabs and precision electronics cleanrooms, capturing nano-scale particles to meet ISO Class 1–3 standards and maximize product yield.
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High-efficiency filtration for commercial building HVAC systems, improving indoor air quality, reducing energy consumption, and extending equipment service life.
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Precision air filtration for data centers, shielding servers and critical hardware from dust contamination to keep cooling systems running efficiently and reliably.
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Dedicated filtration systems for farms and livestock facilities — capturing dust, adsorbing ammonia, and inhibiting pathogen spread to improve animal health and overall productivity.
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Designed for spray booths and grinding workshops, efficiently capturing paint mist, metal dust, and wood chips to meet emission standards while protecting finished surface quality.
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Pre-Filter (G1–G4)
First-Stage Large-Particle Capture
Medium-Efficiency Filter (F5–F9)
Precise PM2.5 Capture
HEPA High-Efficiency Filter
Sterile-Grade Purification
ULPA Ultra-High Efficiency Filter
Sub-Micron Particle Capture
First-Stage Large-Particle Capture
The first line of defense, capturing particles ≥5 μm such as dust, hair, and fibers to protect downstream filters and extend overall system service life.
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Captures fine particles of 1–5 μm including PM2.5, pollen, and mold spores, significantly improving indoor air quality for commercial HVAC and ventilation systems.
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≥99.97% filtration efficiency for particles ≥0.3 μm, delivering sterile-grade clean air widely used in medical, pharmaceutical, and electronics manufacturing.
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≥99.9995% efficiency for particles ≥0.12 μm, meeting the extreme cleanliness demands of semiconductor fabs, aerospace, and other ultra-precision applications.
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High-Temperature Resistant
Industrial-Grade Heat Tolerance
Washable & Reusable
Cut Costs, Reduce Waste
Activated Carbon
Odor & Harmful Gas Removal
Bag Filter
High Dust-Holding, Long Life
Panel / Pleated Filter
Compact Space-Saving Design
Low-Resistance Airflow
Energy-Saving Operation
Industrial-Grade Heat Tolerance
Built with specialized heat-resistant materials, operating stably up to 250°C for paint ovens, industrial dryers, and high-temperature process environments.
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Cleanable by water washing or air blowing, reusable multiple times to significantly reduce replacement frequency and O&M costs — an economical, eco-friendly choice.
View Related Products →Odor & Harmful Gas Removal
Leverages activated carbon's high adsorption capacity to eliminate odors, VOCs, and formaldehyde, ideal for newly renovated spaces and industrial exhaust treatment.
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Bag-style construction delivers a larger filtration area, high dust-holding capacity, and extended service life — ideal for high-dust environments with reduced replacement frequency.
View Related Products →Compact Space-Saving Design
Compact form factor for easy installation and replacement; pleated structure maximizes filtration area within a small footprint for higher efficiency.
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Low-resistance design minimizes pressure drop while maintaining filtration performance, reducing fan energy consumption for cost-effective, eco-friendly operation.
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Semiconductor Wafer Fabrication Cleanroom Air Purification System
Customer: A leading international semiconductor giant (Asia-Pacific region)
Industry Challenges:
Chip manufacturing cleanroom must meet ISO Class 2 standard (≤100 particles/m³), but the original filters were insufficient, causing wafer surface contamination and only 85% yield.
Frequent downtime for maintenance affected production capacity.
Solution:
Deployed multi-layer ULPA filtration system (99.9995% efficiency @ 0.1μm) combined with intelligent differential pressure monitoring module.
Used low-resistance filter media to reduce energy consumption by 20%.
Results (Before vs. After Upgrade):
Metric | Before Upgrade | After Upgrade |
|---|---|---|
Cleanroom Class | ISO 3 | ISO 1 |
Wafer Yield | 85% | 97% ↑ |
Annual Maintenance Cost | $1.2M | $0.6M ↓ |
Energy Consumption | 120 kW/h | 95 kW/h ↓ |
Website Highlights:
Dynamic charts comparing yield and cost before and after upgrade.
Customer Testimonial:
“After upgrading the air filtration system, our 3nm chip yield has set a new industry benchmark!” — Production Director, Client Company